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80 X 40 Titanium Sputtering Target For Mechanical Industrial
|Place of Origin||Shanxi China (mainland)|
|Brand Name||NewFuture Titanium|
|Minimum Order Quantity||1kg|
|Packaging Details||Inner packaging:plastic bag packaged with supporting thing inside Outer packaging:plywood case with strips as you request|
|Delivery Time||Depend on real situation,AS general:2-15days|
|Payment Terms||T/T, Western Union, Paypal, Credit card, Money Gram|
|Supply Ability||10 ton|
|Titanium Content||0.999||Impurity Content||0.2(%)|
|Granularity||1 (mesh)||Specification||Custom Made|
|Value-added Services||Marking||Use||Mechanical, Industrial|
Industrial Titanium Sputtering Target,
80x40 Titanium Target,
Titanium Sputtering Target Materials
Spot Titanium Target Φ80×40
Structural Development of Titanium Targets
The first stage:
Early chip foundries had high profit margins. They mainly use 100-150mm magnetron sputtering machines with less power. The sputtered film is thick and the chip size is large. At that time, titanium targets for integrated circuits were mainly 100-150mm single and composite targets.
In the second stage, the chip line width is narrowed according to Moore's Law. In order to increase profits, chip foundries have increased the sputtering power of the equipment, mainly using 150-200mm sputtering equipment. This requires increasing the size of the target while maintaining high thermal conductivity, low price, and some strength. During this period, titanium targets mainly consisted of aluminum alloy backplate diffusion welding and copper alloy backplate brazing and welding.
|Shape||Square /round, according to your request|
Round: dia 25~250mm
Rectangular: length up to 1500mm
Customization is available
|Proportion(wt%)||5-80 ± 0.2Ti at your request.|
|Certificates||ISO9001:2008, the third test report|
widely used in coating processing industries
a: architectural glass, car using glass, graphic display field.
b: electronic and semiconductor field.
c: decoration and mould field.
High Hard texture
Low impurity content
Better heat dissipation
High Tensile strength
The main products are high-purity nickel target, high-purity vanadium target, high-purity iron target, high-purity copper target, high-purity aluminum target, high-purity chromium target, high-purity titanium target, nickel-chromium alloy target, nickel-iron alloy target material, nickel-vanadium alloy target, nickel-copper alloy target, high-purity nickel evaporation material, high-purity titanium evaporation material, high-purity copper evaporation material, high-purity gold evaporation material, etc. Products are mainly used in semiconductors, integrated circuits, flat panel displays, LED chips, photovoltaic solar energy, optical optical communication, opto-magnetic storage, electronic packaging, electric new energy, Low-E glass, decorative coating, tool coating and other fields.
Chemical plants: Titanium is highly resistant to corrosion. It is used in many types of chemical equipment.
Seawater consumption: Titanium is widely used in nuclear power plants and fossil power plants. It is used in CONDENSOR, a large heat exchanger that cools the steam from the turbine in a way that does not corrode the sea water, so that the wall thickness of the tubes is as thin as 0.5 mm. Condenser tubes consume about 20% of domestic titanium consumption.